During the manufacturing process, the photoresist is applied to the surface of the silicon wafer and then exposed to light using a photolithography process. This causes the photoresist to harden in certain areas, forming a pattern that is used as a mask for subsequent etching or other processing steps.
Once the photolithography process is complete, the remaining photoresist must be removed from the surface of the silicon wafer in order to expose the underlying pattern and prepare the wafer for further processing. This is known as photoresist stripping, and it is an important step in the manufacturing process because it ensures that the wafer is clean and free of contamination.
There are several reasons why it is important to remove photoresists from silicon samples during the manufacturing process:
First, the photoresist can interfere with subsequent processing steps if it is not removed, which can affect the quality and performance of the final product.
Second, photoresists can also act as a source of contamination, which can introduce defects or impurities into the final product.
Finally, the photoresist can be difficult to remove if it is allowed to crosslink on the surface of the silicon wafer. It is important to strip it as soon as possible after the photolithography process is complete.
All samply holders are compatible with the process of photoresist stripping for Silicon substrates. We recommend using a dedicated holder per process to minimize cross-contamination.
Acetone or 1165 remover can be used to remove the photoresist.
1165 Remover and other brands
There are many types of photoresist/polymer stripping solutions similar to 1165 remover. Here are some equivalent formulations:
All are compatible with samply sample holders.
Method:
1. Place the silicon samples with photoresist into a samply sample holder. Then load into a suitable heat-resistant beaker with a stirrer bar.
2. Pour enough acetone/1165 Remover into the container to completely cover the samples. Place the container on the hotplate and set the temperature to 60°C (140°F).
3. Allow the acetone to heat up until it reaches the desired temperature. This may take several minutes. Once the acetone has reached the desired temperature, turn on the stirrer. This will help to ensure that all of the surfaces of the silicon samples are exposed to the cleaning solution.
4. Place a watch glass ontop of the beaker to prevent evaporation. Allow the silicon samples in the hot acetone solution for at least 30 minutes. This will help to remove the photoresist from the surfaces of the samples.
5. After the samples have been cleaned for the required time, carefully transfer the samply holder into a beaker of IPA.
6. Allow the samples to soak in the IPA for at least 10 minutes, or longer if necessary to remove any remaining contaminants or residue.
7. After the samples have soaked in the IPA for the required time, remove the samples and dry them using compressed air.
Samply holders are compatible with stirrer bars, which add agitation to the process and will improve the overall cleaning of the samples.
This process is suitable for stripping photoresists from silicon samples and may react with other substrates. It’s important to use appropriate safety precautions when working with solvents. Wearing gloves and eye protection and working in a fume hood are examples of this.
Samply sample holders are compatible with a large range of chemicals listed in this compatibility chart. The range of samply sample holders is designed to fit into standard lab beakers (25ml, 50ml, 100ml) eg Fischer.
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